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KMG
Catalog Number:
(71009-320)
Supplier:
KMG
Description:
Ammonium hydroxide is used in a SC-1 solution to remove organics and particles from the surface of a wafer. The ammonium hydroxide allows undercuttin...
Catalog Number:
(71009-358)
Supplier:
KMG
Description:
Hydrochloric Acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
Catalog Number:
(71009-508)
Supplier:
KMG
Description:
Acetone Cleanroom LP, Acetone can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead remover. 350lb.
Catalog Number:
(KM431-200440)
Supplier:
KMG
Description:
IPA is used to rinse silicon wafers and to leave a clean dry residue free surface usually after organic stripping solutions
Catalog Number:
(71009-334)
Supplier:
KMG
Description:
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity...
Catalog Number:
(89400-748)
Supplier:
KMG
Description:
Ammonium fluoride is used to dilute HF solutions for silicon dioxide film etching.
Catalog Number:
(71009-344)
Supplier:
KMG
Description:
N-Methylpyrrolidone (NMP) is a safer alternative to many hazardous solvents. NMP can be used remove cured photoresist, clean and dewax silicon wafers...
Catalog Number:
(71009-532)
Supplier:
KMG
Description:
Sulfuric acid is used in semiconductor processing to remove residual organic contamination prior to metalization steps.
Store at less than ...
Catalog Number:
(89400-770)
Supplier:
KMG
Description:
Wet chemical etching is an integral part of semiconductor manufacturing process. KMG’s line of ultra etchants (BOE w/surfactant) offers a variety of s...
Catalog Number:
(10803-036)
Supplier:
KMG
Description:
CR-16, is a nitric acid based chrome etchant used for photolithography masks, semiconductor and MEMS processes. It is designed to provide minimum unde...
Supplier:
KMG
Description:
Hydrofluoric Acid 49% is used to soluabilize many oxides, particularly silicon dioxide, the most widely used insulator on semiconductor devices.
Catalog Number:
(71009-372)
Supplier:
KMG
Description:
IPA is used to rinse silicon wafers and to leave a clean dry residue free surface usually after organic stripping solutions.
Catalog Number:
(89400-780)
Supplier:
KMG
Description:
The Gensolve product line are organic stripping compositions that remove hydrophillic polymeric organic coating, such as photoresists and their residu...
Catalog Number:
(71009-340)
Supplier:
KMG
Description:
Nitric acid is a strong oxidizing agent. Nitric acid is used to oxidize silicon to silicon dioxide and to dissolve metals to metal nitrates. Nitric a...
Catalog Number:
(71009-318)
Supplier:
KMG
Description:
can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead ...
Catalog Number:
(71009-382)
Supplier:
KMG
Description:
Sulfuric Acid is used in semiconductor processing to remove residual organic contamination prior to metalization steps.
Store at less than 109⁰ F
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 is still displayed and you need assistance, please call us at 1-800-932-5000.
Stock for this item is limited, but may be available in a warehouse close to you. Please make sure that you are logged in to the site so that available stock can be displayed. If the
is still displayed and you need assistance, please call us at 1-800-932-5000.
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