64023
64022
71009-520EA
2620.62
USD
InStock
71009-520
71009-366
Hydrogen peroxide 30.00 - 32.00% LP
Hydrogen peroxide
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.